Edinburgh Research Explorer

Automated Generation, Fabrication and Measurement of Parametric Test Structures for Rapid Prototyping Using Optical Maskless Lithography

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication33rd IEEE International Conference on Microelectronic Test Structures (ICMTS 2020)
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
DOIs
Publication statusPublished - 4 Jun 2020

Abstract

This paper describes the use of open-source electronic design automation tools, which have been developed and adapted for maskless lithography, to enable automation of the design, layout and measurement of parametric test structures. Two test structures are presented as case studies for characterisation of microelectronic and micro-electromechanical systems technologies using electrical and profilometry measurements respectively.

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