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Direct top-down fabrication of nanoscale electrodes for organic semiconductors using fluoropolymer resists

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    Rights statement: Copyright © 2012 Springer-Verlag Berlin Heidelberg. All rights reserved.

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http://link.springer.com/article/10.1007%2Fs00339-012-7411-7
Original languageEnglish
Pages (from-to)1051-1056
Number of pages6
JournalApplied Physics A: Materials Science & Processing
Volume111
Issue number4
Early online date16 Nov 2012
DOIs
Publication statusPublished - Jun 2013

Abstract

We report the use of a fluoropolymer resist for the damage-free e-beam lithographic patterning of organic semiconductors. The same material is also shown to be suitable as an orthogonal electron beam resist for the patterning of top-contact electrodes on organic thin films. We demonstrate this by characterizing pentacene field effect transistors with feature sizes as small as 100 nm and compare the performance of bottom- and top-contacted devices.

    Research areas

  • organic semiconductor, nanoelectrode fabrication

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