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Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT

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Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT. / Goodfriend, Nathan; Starinskiy, Sergei V.; Nerushev, Oleg; Bulgakova, Nadezhda M.; Bulgakov, Alexander; Campbell, Eleanor E.B.

In: Applied Physics A: Materials Science & Processing, Vol. 122, No. 3, 154, 01.03.2016.

Research output: Contribution to journalArticle

Harvard

Goodfriend, N, Starinskiy, SV, Nerushev, O, Bulgakova, NM, Bulgakov, A & Campbell, EEB 2016, 'Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT', Applied Physics A: Materials Science & Processing, vol. 122, no. 3, 154. https://doi.org/10.1007/s00339-016-9666-x

APA

Goodfriend, N., Starinskiy, S. V., Nerushev, O., Bulgakova, N. M., Bulgakov, A., & Campbell, E. E. B. (2016). Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT. Applied Physics A: Materials Science & Processing, 122(3), [154]. https://doi.org/10.1007/s00339-016-9666-x

Vancouver

Goodfriend N, Starinskiy SV, Nerushev O, Bulgakova NM, Bulgakov A, Campbell EEB. Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT. Applied Physics A: Materials Science & Processing. 2016 Mar 1;122(3). 154. https://doi.org/10.1007/s00339-016-9666-x

Author

Goodfriend, Nathan ; Starinskiy, Sergei V. ; Nerushev, Oleg ; Bulgakova, Nadezhda M. ; Bulgakov, Alexander ; Campbell, Eleanor E.B. / Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT. In: Applied Physics A: Materials Science & Processing. 2016 ; Vol. 122, No. 3.