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Stopping of energetic argon cluster ions in graphite: Role of cluster momentum and charge

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    Rights statement: Copyright © 2010 by the American Physical Society. This article may be downloaded for personal use only. Any other use requires prior permission of the author(s) and the American Physical Society.

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http://prb.aps.org/abstract/PRB/v82/i20/e201403
Original languageEnglish
Article number201403
Pages (from-to)-
Number of pages4
JournalPhysical Review B: Condensed Matter and Materials Physics
Volume82
Issue number20
DOIs
Publication statusPublished - 8 Nov 2010

Abstract

We show that the implantation depth for argon clusters in graphite scales linearly with cluster momentum. A plot of implantation depth versus the momentum scaled with the projected surface area of the cluster falls on the same universal plot as that shown for semiconductor and metallic clusters, thus providing a universal scaling law for cluster implantation. Molecular dynamics simulations provide some insight to the mechanisms behind the empirical observation.

    Research areas

  • IMPLANTATION, SOLIDS, BOMBARDMENT, SURFACES, IMPACT, DEPTH

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